JPH0343779B2 - - Google Patents
Info
- Publication number
- JPH0343779B2 JPH0343779B2 JP58081272A JP8127283A JPH0343779B2 JP H0343779 B2 JPH0343779 B2 JP H0343779B2 JP 58081272 A JP58081272 A JP 58081272A JP 8127283 A JP8127283 A JP 8127283A JP H0343779 B2 JPH0343779 B2 JP H0343779B2
- Authority
- JP
- Japan
- Prior art keywords
- base region
- region
- impurity concentration
- cvd film
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
- H10D48/30—Devices controlled by electric currents or voltages
- H10D48/32—Devices controlled by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H10D48/34—Bipolar devices
- H10D48/345—Bipolar transistors having ohmic electrodes on emitter-like, base-like, and collector-like regions
Landscapes
- Bipolar Transistors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58081272A JPS59205758A (ja) | 1983-05-09 | 1983-05-09 | トランジスタの製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58081272A JPS59205758A (ja) | 1983-05-09 | 1983-05-09 | トランジスタの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59205758A JPS59205758A (ja) | 1984-11-21 |
JPH0343779B2 true JPH0343779B2 (en]) | 1991-07-03 |
Family
ID=13741727
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58081272A Granted JPS59205758A (ja) | 1983-05-09 | 1983-05-09 | トランジスタの製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59205758A (en]) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010046284A1 (en) * | 2008-10-23 | 2010-04-29 | Applied Materials, Inc. | Semiconductor device manufacturing method, semiconductor device and semiconductor device manufacturing installation |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51102556A (en]) * | 1975-03-07 | 1976-09-10 | Hitachi Ltd | |
JPS5396666A (en) * | 1977-02-04 | 1978-08-24 | Hitachi Ltd | Manufacture of semiconductor device with pn junction |
-
1983
- 1983-05-09 JP JP58081272A patent/JPS59205758A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS59205758A (ja) | 1984-11-21 |
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